Spectroscopic ellipsometry is a non-destructive optical technique, precisely characterizing thin films from sub-nanometer to tens of microns thick. The technique covers a wide spectrum range beyond visible wavelengths. It has been applied to outer space research in deep ultra-violet, sensor designs in infra-red, and understanding properties at terahertz frequencies.

Ellipsometry is sensitive to film thickness and uniformity, refractive index, bandgap energy, alloy composition, anisotropy, surface roughness and conductivity. In this presentation, advanced applications using ellipsometer in the fields such as wide bandgap semiconductors, OLED display, optical coatings, photovoltaic, and 2D materials will be demonstrated. Dynamic ellipsometry has been attracting more and more attention, providing real-time process control and property monitoring. Examples of ellipsometry in understanding liquid/solid interface absorption and monitoring in-situ deposition will be presented.

An interactive Q&A session will follow the presentation.

Presented by J.A. Woollam